Authors: Une, A Kai, Y Mochida, M Matsui, S

Citation: A. Une et al., Flattening ability of a vacuum pin chuck around the periphery of a processed wafer, MICROEL ENG, 57-8, 2001, pp. 49-57

Authors: Une, A Kai, Y Mochida, M Matsui, S Ohira, F

Citation: A. Une et al., Influence of wafer chucking on focus margin for resolving fine patterns inoptical lithography, MICROEL ENG, 53(1-4), 2000, pp. 137-140