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Authors: Liberman, V Bloomstein, TM Rothschild, M Sedlacek, JHC Uttaro, RS Bates, AK Van Peski, C Orvek, K

Citation: V. Liberman et al., Materials issues for optical components and photomasks in 157 nm lithography, J VAC SCI B, 17(6), 1999, pp. 3273-3279

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Citation: V. Liberman et al., Excimer-laser-induced degradation of fused silica and calcium fluoride for193-nm lithographic applications, OPTICS LETT, 24(1), 1999, pp. 58-60

Authors: Liberman, V Rothschild, M Sedlacek, JHC Uttaro, RS Grenville, A

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