Authors:
Dauksher, WJ
Clemens, SB
Resnick, DJ
Smith, KH
Mangat, PJS
Rauf, S
Ventzek, PLG
Arunachalam, V
Ramamurthi, BN
Ashraf, H
Lea, L
Hall, S
Johnston, IR
Hopkins, J
Bhardwaj, JK
Citation: Wj. Dauksher et al., Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks, MICROEL ENG, 57-8, 2001, pp. 607-612
Citation: S. Nakamura et al., Monte Carlo simulation study of the scaling of electron transport parameters in crossed dc electric and magnetic fields, J APPL PHYS, 85(5), 1999, pp. 2534-2539