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Results:
1-7
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Results: 7
Authors:
Li, H
Vereecke, G
Maex, K
Froyen, L
Citation: H. Li et al., Gaseous impurities in Co silicidation - Impact and solutions, J ELCHEM SO, 148(6), 2001, pp. G344-G354
Authors:
Vereecke, G
Kondoh, E
Richardson, P
Maex, K
Heyns, MM
Citation: G. Vereecke et al., Wafer thermal desorption spectrometry in a rapid thermal processor using atmosheric pressure ionization mass spectrometry, IEEE SEMIC, 13(3), 2000, pp. 315-321
Authors:
Vereecke, G
Rohr, E
Heyns, MM
Citation: G. Vereecke et al., Influence of beam incidence angle on dry laser cleaning of surface particles, APPL SURF S, 157(1-2), 2000, pp. 67-73
Authors:
Vereecke, G
Schaekers, M
Verstraete, K
Arnauts, S
Heyns, MM
Plante, W
Citation: G. Vereecke et al., Quantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach, J ELCHEM SO, 147(4), 2000, pp. 1499-1501
Authors:
Kondoh, E
Vereecke, G
Heyns, MM
Maex, K
Gutt, T
Citation: E. Kondoh et al., Measurements of trace gaseous ambient impurities on an atmospheric pressure rapid thermal processor, J VAC SCI A, 17(2), 1999, pp. 650-656
Authors:
Vereecke, G
Rouxhet, PG
Citation: G. Vereecke et Pg. Rouxhet, New method to correct for the influence of organic contamination on intensity ratios in quantitative XPS, SURF INT AN, 27(8), 1999, pp. 761-769
Authors:
Vereecke, G
Rohr, E
Heyns, MM
Citation: G. Vereecke et al., Laser-assisted removal of particles on silicon wafers, J APPL PHYS, 85(7), 1999, pp. 3837-3843
Risultati:
1-7
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