Authors: Tristant, P Ding, Z Vinh, QBT Hidalgo, H Jauberteau, JL Desmaison, J Dong, C

Citation: P. Tristant et al., Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics andinfluence of the RF bias, THIN SOL FI, 390(1-2), 2001, pp. 51-58