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Citation: K. Simon et al., Overlay budget analysis for the 100 nm device generation, MICROEL ENG, 46(1-4), 1999, pp. 457-460

Authors: Vladimirsky, Y Bourdillon, A Vladimirsky, O Jiang, W Leonard, Q

Citation: Y. Vladimirsky et al., Demagnification in proximity x-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction, J PHYS D, 32(22), 1999, pp. L114-L118