Authors:
Ledentsov, NN
Litvinov, D
Rosenauer, A
Gerthsen, D
Soshnikov, IP
Shchukin, VA
Ustinov, VM
Egorov, AY
Zukov, AE
Volodin, VA
Efremov, MD
Preobrazhenskii, VV
Semyagin, BP
Bimberg, D
Alferov, ZI
Citation: Nn. Ledentsov et al., Interface structure and growth mode of quantum wire and quantum dot GaAs-AlAs structures on corrugated (311)A surfaces, J ELEC MAT, 30(5), 2001, pp. 463-470
Authors:
Kachurin, GA
Rebohle, L
Tyschenko, IE
Volodin, VA
Voelskow, M
Skorupa, W
Froeb, H
Citation: Ga. Kachurin et al., Formation of photoluminescence centers during annealing of SiO2 layers implanted with Ge ions, SEMICONDUCT, 34(1), 2000, pp. 21-26
Authors:
Volodin, VA
Efremov, MD
Preobrazhenskii, VV
Semyagin, BR
Bolotov, VV
Sachkov, VA
Citation: Va. Volodin et al., Transverse optical phonon splitting in GaAs/AlAs superlattices grown on the GaAs(311) surface studied by the method of Raman light scattering, SEMICONDUCT, 34(1), 2000, pp. 61-66
Citation: Va. Volodin et al., Raman study of confined TO phonons in GaAs/AlAs superlattices grown on GaAs (311)A and B surfaces, SUPERLATT M, 26(1), 1999, pp. 11-16
Authors:
Kachurin, GA
Leier, AF
Zhuravlev, KS
Tyschenko, IE
Gutakovskii, AK
Volodin, VA
Skorupa, W
Yankov, RA
Citation: Ga. Kachurin et al., Effect of ion dose and annealing mode on photoluminescence from SiO2 implanted with Si ions, SEMICONDUCT, 32(11), 1998, pp. 1222-1228
Authors:
Volodin, VA
Efremov, MD
Gritsenko, VA
Kochubei, SA
Citation: Va. Volodin et al., Raman study of silicon nanocrystals formed in SINx films by excimer laser or thermal annealing, APPL PHYS L, 73(9), 1998, pp. 1212-1214