Authors:
Volland, B
Shi, F
Heerlein, H
Rangelow, IW
Hudek, P
Kostic, I
Cekan, E
Vonach, H
Loeschner, H
Horner, C
Stengl, G
Buschbeck, H
Zeininger, M
Bleeker, A
Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Authors:
de Jager, PWH
Mertens, B
Munro, E
Cekan, E
Lammer, G
Vonach, H
Buschbeck, H
Zeininger, M
Horner, C
Loschner, H
Stengl, G
Bleeker, AJ
Citation: Pwh. De Jager et al., Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 617-620
Authors:
de Jager, PWH
Derksen, G
Mertens, B
Cekan, E
Lammer, G
Vonach, H
Buschbeck, H
Zeininger, M
Horner, C
Loschner, H
Stengl, G
Bleeker, AJ
Benschop, J
Shi, F
Volland, B
Hudek, P
Heerlein, H
Rangelow, IW
Kaesmaier, R
Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106
Authors:
Bateman, FB
Haight, RC
Chadwick, MB
Sterbenz, SM
Grimes, SM
Vonach, H
Citation: Fb. Bateman et al., Light charged-particle production from neutron bombardment of silicon up to 60 MeV: Role of level densities and isospin - art. no. 064609, PHYS REV C, 6006(6), 1999, pp. 4609