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Results: 2
SIO2 ETCHING CHARACTERISTICS USING UHF PLASMA SOURCE
Authors:
NOGAMI H WANI E NAKAGAWA Y MASHIMO K SAMUKAWA S TSUKADA T
Citation:
H. Nogami et al., SIO2 ETCHING CHARACTERISTICS USING UHF PLASMA SOURCE, NEC research & development, 38(2), 1997, pp. 150-157
ETCHING CHARACTERISTICS BY M=0 HELICON WAVE PLASMA
Authors:
TSUKADA T NOGAMI H NAKAGAWA Y WANI E
Citation:
T. Tsukada et al., ETCHING CHARACTERISTICS BY M=0 HELICON WAVE PLASMA, JPN J A P 1, 33(7B), 1994, pp. 4433-4437
Risultati:
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