Authors: RAKHSHANDEHROO MR WEIGOLD JW TIAN WC PANG SW

Citation: Mr. Rakhshandehroo et al., DRY-ETCHING OF SI FIELD EMITTERS AND HIGH-ASPECT-RATIO RESONATORS USING AN INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2849-2854

Authors: WEIGOLD JW PANG SW

Citation: Jw. Weigold et Sw. Pang, FABRICATION OF THICK SI RESONATORS WITH A FRONTSIDE-RELEASE ETCH-DIFFUSION PROCESS, Journal of microelectromechanical systems, 7(2), 1998, pp. 201-206

Authors: WEIGOLD JW JUAN WH PANG SW

Citation: Jw. Weigold et al., DRY-ETCHING OF DEEP SI TRENCHES FOR RELEASED RESONATORS IN A CL-2 PLASMA, Journal of the Electrochemical Society, 145(5), 1998, pp. 1767-1771

Authors: WEIGOLD JW JUAN WH PANG SW

Citation: Jw. Weigold et al., ETCHING AND BORON-DIFFUSION OF HIGH-ASPECT-RATIO SI TRENCHES FOR RELEASED RESONATORS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 267-272