Authors: TIPTON GD BLAIN MG WESTERFIELD PL TRUTNA LS MAXWELL KL

Citation: Gd. Tipton et al., OPTIMIZATION OF AN ELECTRON-CYCLOTRON-RESONANCE PLASMA ETCH PROCESS FOR N- HBR PROCESS CHEMISTRY( POLYSILICON ), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 416-421