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SCHRODEROEYNHAUSEN F
BURKHARDT B
FLADUNG T
KOTTER F
SCHNIEDERS A
WIEDMANN L
BENNINGHOVEN A
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Authors:
STORM W
WOLANY D
SCHRODER F
BECKER G
BURKHARDT B
WIEDMANN L
Citation: W. Storm et al., ANALYSIS OF STOICHIOMETRY AND OXIDE-GROWTH OF HF TREATED GAAS(100) BYX-RAY PHOTOELECTRON-SPECTROSCOPY AND TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 147-153
Authors:
JAHN PW
PETRAT FM
WOLANY D
DEIMEL M
GANTENFORT T
SCHMERLING C
WENSING H
WIEDMANN L
BENNINGHOVEN A
Citation: Pw. Jahn et al., COMBINED INSTRUMENT FOR THE ONLINE INVESTIGATION OF PLASMA-DEPOSITED OR ETCHED SURFACES BY MONOCHROMATIZED X-RAY PHOTOELECTRON-SPECTROSCOPYAND TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(3), 1994, pp. 671-676
Authors:
ALBERS T
NEUMANN M
LIPINSKY D
WIEDMANN L
BENNINGHOVEN A
Citation: T. Albers et al., COMBINED DEPTH PROFILE ANALYSIS WITH SNMS, SIMS AND XPS - PREFERENTIAL SPUTTERING AND OXYGEN-TRANSPORT IN BINARY METAL-OXIDE MULTILAYER SYSTEMS, Surface and interface analysis, 22(1-12), 1994, pp. 9-13
Authors:
PETRAT FM
WOLANY D
SCHWEDE BC
WIEDMANN L
BENNINGHOVEN A
Citation: Fm. Petrat et al., COMPARATIVE IN-SITU TOF-SIMS XPS STUDY OF POLYSTYRENE MODIFIED BY ARGON, OXYGEN AND NITROGEN PLASMAS/, Surface and interface analysis, 21(6-7), 1994, pp. 402-406