Authors: SCHOLZ R GOSELE U WISCHMEYER F NIEMANN E

Citation: R. Scholz et al., PREVENTION OF MICROPIPES AND VOIDS AT BETA-SIC SI(100) INTERFACES/, Applied physics A: Materials science & processing, 66(1), 1998, pp. 59-67

Authors: SCHOLZ R GOSELE U NIEMANN E WISCHMEYER F

Citation: R. Scholz et al., MICROPIPES AND VOIDS AT BETA-SIC SI(100) INTERFACES - AN ELECTRON-MICROSCOPY STUDY/, Applied physics A: Materials science & processing, 64(2), 1997, pp. 115-125

Authors: SCHOLZ R GOSELE U NIEMANN E LEIDICH D WISCHMEYER F

Citation: R. Scholz et al., MICROPIPE DEFECTS AND VOIDS AT BETA-SIC SI(100) INTERFACES/, DIAMOND AND RELATED MATERIALS, 6(10), 1997, pp. 1365-1368