Authors:
SHUL RJ
LOVEJOY ML
WORD JC
HOWARD AJ
RIEGER DJ
KRAVITZ SH
Citation: Rj. Shul et al., HIGH-RATE REACTIVE ION ETCH AND ELECTRON-CYCLOTRON-RESONANCE ETCHING OF GAAS VIA HOLES USING THICK POLYIMIDE AND PHOTORESIST MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 657-659
Authors:
KRAVITZ SH
WORD JC
BAUER TM
SEIGAL PK
ARMENDARIZ MG
Citation: Sh. Kravitz et al., A PASSIVE MICROMACHINED DEVICE FOR ALIGNMENT OF ARRAYS OF SINGLE-MODEFIBERS FOR HERMETIC PHOTONIC PACKAGING - THE CLASP CONCEPT, IEEE transactions on components, packaging, and manufacturing technology. Part B, Advanced packaging, 19(1), 1996, pp. 83-89