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Citation: Pr. Deshmukh et al., Resist debris formation and proximity exposure effect in electron beam lithography, J VAC SCI B, 18(2), 2000, pp. 873-876

Authors: Joshi, BC Eranna, G Runthala, DP Dixit, BB Wadhawan, OP Vyas, PD

Citation: Bc. Joshi et al., LPCVD and PECVD silicon nitride for microelectronics technology, I J ENG M S, 7(5-6), 2000, pp. 303-309

Authors: Deshmukh, PR Rangra, KJ Wadhawan, OP

Citation: Pr. Deshmukh et al., Resist debris formation in electron beam lithography, VACUUM, 52(4), 1999, pp. 469-476