Authors: Ogata, T Inoue, M Nakamura, T Tsuji, N Kobayashi, K Kawase, K Kurokawa, H Kaneoka, T Wake, S Arima, H

Citation: T. Ogata et al., Impact of thermal nitridation on microscopic stress-induced leakage current in sub-10-nm silicon dioxides, JPN J A P 1, 39(3A), 2000, pp. 1027-1031