Authors: McCormick, BJ Siemer, C Afroz, F Wasson, JR Eichhorn, DM Scott, B Shah, S Noffsinger, K Kahol, PK

Citation: Bj. Mccormick et al., The copper acetylenedicarboxylate system, SYNTH METAL, 120(1-3), 2001, pp. 969-970

Authors: Torres, JL Nounu, HN Wasson, JR Wolfe, JC Lutz, J Haugeneder, E Loschner, H Stengl, G Kaesmaier, R

Citation: Jl. Torres et al., Experimental evaluation of an optimized radiation cooling geometry for ionprojection lithography masks, J VAC SCI B, 18(6), 2000, pp. 3207-3209

Authors: Dauksher, WJ Resnick, DJ Clemens, SB Standfast, DL Masnyj, ZS Wasson, JR Bergmann, NM Han, SI Mangat, PJS

Citation: Wj. Dauksher et al., TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masks, J VAC SCI B, 18(6), 2000, pp. 3232-3236