Authors: Mirouh, K Bouabellou, A Halimi, R Mosser, A Ehret, G Werckman, J

Citation: K. Mirouh et al., Cross-sectional TEM investigations of the influence of P+ ions implanted in the Si substrate on the atomic interdiffusion in the Cr-Si system, MAT SCI E B, 73(1-3), 2000, pp. 116-119