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Results:
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Results: 10
Authors:
Gritsch, M
Piplits, K
Barbist, R
Wilhartitz, P
Hutter, H
Citation: M. Gritsch et al., SIMS analysis of the oxidation behaviour of SiFeCr coated technical refractory metal alloys, MATER CORRO, 52(7), 2001, pp. 501-508
Authors:
Gritsch, M
Piplits, K
Hutter, H
Wilhartitz, P
Wildner, H
Martinz, HP
Citation: M. Gritsch et al., Investigations on the oxidation behavior of technical molybdenum foils by means of secondary-ion mass spectrometry, SURF SCI, 454, 2000, pp. 284-288
Authors:
Dreer, S
Wilhartitz, P
Piplits, K
Hutter, H
Kopnarski, M
Friedbacher, G
Citation: S. Dreer et al., Quantitative sputter depth profiling of silicon- and aluminium oxynitride films, MIKROCH ACT, 133(1-4), 2000, pp. 75-87
Authors:
Gritsch, M
Piplits, K
Barbist, R
Wilhartitz, P
Hutter, H
Citation: M. Gritsch et al., Investigations on the thermal cycling stability of SiFeCr coated NbWZr, MIKROCH ACT, 133(1-4), 2000, pp. 89-93
Authors:
Gritsch, M
Brunner, C
Piplits, K
Hutter, H
Wilhartitz, P
Schintlmeister, A
Martinz, HP
Citation: M. Gritsch et al., Application of scanning SIMS techniques for the evaluation of the oxidation behavior of high-purity molybdenum, FRESEN J AN, 365(1-3), 1999, pp. 188-194
Authors:
Dreer, S
Krismer, R
Wilhartitz, P
Citation: S. Dreer et al., Multidimensional optimisation of process parameters by experimental designfor the deposition of aluminium and silicon oxynitride films with predictable composition, SURF COAT, 114(1), 1999, pp. 29-38
Authors:
Dreer, S
Krismer, R
Wilhartitz, P
Friedbacher, G
Citation: S. Dreer et al., Statistical evaluation of refractive index, growth rate, hardness and Young's modulus of aluminium oxynitride films, THIN SOL FI, 354(1-2), 1999, pp. 43-49
Authors:
Weinbruch, S
Anastassiadis, A
Ortner, HM
Martinz, HP
Wilhartitz, P
Citation: S. Weinbruch et al., On the mechanism of high-temperature oxidation of ODS superalloys: Significance of yttrium depletion within the oxide scales, OXID METAL, 51(1-2), 1999, pp. 111-128
Authors:
Dreer, S
Wilhartitz, P
Mersdorf, E
Piplits, K
Friedbacher, G
Citation: S. Dreer et al., Quantitative analysis of thin aluminium-oxynitride films by EPMA, MIKROCH ACT, 131(3-4), 1999, pp. 211-218
Authors:
Dreer, S
Wilhartitz, P
Mersdorf, E
Friedbacher, G
Citation: S. Dreer et al., Quantitative analysis of silicon-oxynitride films by EPMA, MIKROCH ACT, 130(4), 1999, pp. 281-288
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