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Citation: Sg. Woo et al., Etching characteristics of fine Ta patterns with electron cyclotron resonance chlorine plasma, JPN J A P 1, 39(12B), 2000, pp. 6996-6999

Authors: Kim, SH Woo, SG Ahn, JH

Citation: Sh. Kim et al., Effects of SF6 addition to O-2 plasma on polyimide etching, JPN J A P 1, 39(12B), 2000, pp. 7011-7014

Authors: Kim, SH Moon, HS Woo, SG Ahn, J

Citation: Sh. Kim et al., Study on the properties of interlayer low dielectric polyimide during Cl-based plasma etching of aluminum, JPN J A P 1, 38(12B), 1999, pp. 7122-7125