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Results:
1-11
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Results: 11
Authors:
Tseng, JH
Wu, TB
Citation: Jh. Tseng et Tb. Wu, Ferroelectric lead barium zirconate thin film of high fatigue resistance, APPL PHYS L, 78(12), 2001, pp. 1721-1723
Authors:
Liu, CL
Wu, TB
Citation: Cl. Liu et Tb. Wu, Effects of calcium substitution on the structural and microwave dielectriccharacteristics of [(Pb1-xCax)(1/2)La-1/2] (Mg1/2Nb1/2)O-3 ceramics, J AM CERAM, 84(6), 2001, pp. 1291-1295
Authors:
Chang, CS
Wu, TB
Huang, CK
Shih, WC
Chao, LL
Citation: Cs. Chang et al., Thermal stability and oxidation resistance of W, TiW, W(N) and TiW(N) thinfilms deposited on Si, JPN J A P 1, 39(11), 2000, pp. 6413-6421
Authors:
Lee, HY
Liang, KS
Lee, CH
Wu, TB
Citation: Hy. Lee et al., Real-time x-ray scattering study of growth behavior of sputter-deposited LaNiO3 thin films on Si substrates, J MATER RES, 15(12), 2000, pp. 2606-2611
Authors:
Lin, CH
Yen, BM
Kuo, HC
Chen, HD
Wu, TB
Stillman, GE
Citation: Ch. Lin et al., Domain structure and electrical properties of highly textured PbZrxTi1-xO3thin films grown on LaNiO3-electrode-buffered Si by metalorganic chemical vapor deposition, J MATER RES, 15(1), 2000, pp. 115-124
Authors:
Wu, TB
Shy, HJ
Citation: Tb. Wu et Hj. Shy, Deposition and properties of highly (100)-oriented barium titanate thin films on LaNiO3 electrode, CERAM INT, 26(6), 2000, pp. 599-603
Authors:
Lin, CH
Friddle, PA
Lu, X
Chen, H
Kim, Y
Wu, TB
Citation: Ch. Lin et al., Electrical characteristics of 25 nm Pr(ZrTi)O-3 thin films grown on Si by metalorganic chemical vapor deposition, J APPL PHYS, 88(4), 2000, pp. 2157-2159
Authors:
Chang, CS
Liu, TP
Wu, TB
Citation: Cs. Chang et al., Effects of postannealing on the electrical properties of Ta2O5 thin films deposited on TiN/T, J APPL PHYS, 88(12), 2000, pp. 7242-7248
Authors:
Chang, CS
Wu, TB
Shih, WC
Chao, LL
Citation: Cs. Chang et al., Dielectric and electrical characteristics of titanium-modified Ta2O5 thin films deposited on nitrided polysilicon by metalorganic chemical vapor deposition, JPN J A P 1, 38(12A), 1999, pp. 6812-6816
Authors:
Lin, CH
Lee, SW
Chen, H
Wu, TB
Citation: Ch. Lin et al., Dielectric properties of metal-organic chemical vapor deposited highly textured Pb(ScTa)(1-x)TixO3 (x=0-0.3) relaxor ferroelectric thin films on LaNiO3 electrode buffered Si, APPL PHYS L, 75(16), 1999, pp. 2485-2487
Authors:
Wu, TB
Wu, CM
Chen, ML
Citation: Tb. Wu et al., Dielectric and leakage current characteristics of Ba(Ti1-xZrx)O-3 thin films deposited by rf magnetron sputtering, THIN SOL FI, 334(1-2), 1998, pp. 77-81
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