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Results: 1-9 |
Results: 9

Authors: SASAKI YC SUZUKI Y YAMANASHI H ARAI A YANAGIHARA M
Citation: Yc. Sasaki et al., TIME-RESOLVED FLUORESCENT X-RAY INTERFERENCE, Journal of synchrotron radiation, 5, 1998, pp. 1075-1078

Authors: YAMANASHI H ITO M
Citation: H. Yamanashi et M. Ito, IMAGE SIMULATION OF EXTREME-ULTRAVIOLET LITHOGRAPHY OPTICS - EFFECT OF MULTILAYER COATINGS, JPN J A P 1, 35(12B), 1996, pp. 6475-6479

Authors: OGAWA T YAMAGUCHI A YAMANASHI H ITO M TACHIBANA H MATSUMOTO M SEKITANI T TANAKA K
Citation: T. Ogawa et al., PHOTON-STIMULATED ION DESORPTION MEASUREMENT OF ORGANOSILICON RESIST REACTIONS IN EXTREME-ULTRAVIOLET LITHOGRAPHY, JPN J A P 1, 35(12B), 1996, pp. 6487-6490

Authors: KIKUTA Y MIYASAKA Y ASUKE T YAMANASHI H TAKA T
Citation: Y. Kikuta et al., MEASUREMENTS OF SURFACE-ROUGHNESS OF POLY OLEFIN FILMS BY ATOMIC-FORCE MICROSCOPY, Bunseki Kagaku, 45(4), 1996, pp. 347-351

Authors: ITO M OIZUMI H SOGA T YAMANASHI H OGAWA T KATAGIRI S SEYA E TAKEDA E
Citation: M. Ito et al., SOFT-X-RAY PROJECTION IMAGING WITH MULTILAYER REFLECTION MASKS, Microelectronic engineering, 27(1-4), 1995, pp. 285-290

Authors: TAKEI H MURAI T SAKAMAKI Y YAMANASHI H KANAZAWA R
Citation: H. Takei et al., DEVELOPMENT OF A FLUORO-IMMUNOASSAY USING THE EVANESCENT-WAVE AND APPLICATION TO A CRP ASSAY, Clinical chemistry, 41(6), 1995, pp. 67-67

Authors: SCHECKLER EW OGAWA T YAMANASHI H SOGA T ITO M
Citation: Ew. Scheckler et al., RESIST PATTERN FLUCTUATION LIMITS IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2361-2371

Authors: KATSUMATA M ENDO M YAMANASHI H USHIJIMA H
Citation: M. Katsumata et al., ELECTRICAL-PROPERTIES OF PLASTIC COMPOSITES USING BR2-INTERCALATED VAPOR-GROWN CARBON-FIBERS AS A CONDUCTIVE FILLER, Journal of materials research, 9(7), 1994, pp. 1829-1833

Authors: KATSUMATA M ENDO M USHIJIMA H YAMANASHI H
Citation: M. Katsumata et al., EPOXY COMPOSITES USING VAPOR-GROWN CARBON-FIBER FILLERS FOR ADVANCED ELECTROCONDUCTIVE ADHESIVE AGENTS, Journal of materials research, 9(4), 1994, pp. 841-843
Risultati: 1-9 |