Citation: Yi. Koltsov et al., THE EFFECT OF CONTENT AND PROPERTIES OF C OMPONENTS ON SENSITOMETRIC CHARACTERISTICS OF A POSITIVE PHOTORESIST-DEVELOPER SYSTEM, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(4-5), 1994, pp. 5-9
Citation: Mn. Voroshilova et al., SPECTRAL SENSITIVITY OF PHOTORESISTS BASE D ON 4-SULFOETHERS AND 5-SULFOETHERS OF O-DIAZONAPHTHALENONES, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(1), 1994, pp. 35-39