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Results:
1-21
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Results: 21
Authors:
Kotera, M
Sakai, M
Shimizu, I
Tomo, Y
Yoshida, A
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Influence of electron density distribution at the electron source in a projection exposure system, JPN J A P 1, 40(2A), 2001, pp. 904-909
Authors:
Kotera, M
Ishida, Y
Naruse, K
Sakai, M
Tomo, Y
Simizu, I
Yoshida, A
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Influence of the scattered electrons at the mask in a projection lithography system, MICROEL ENG, 57-8, 2001, pp. 247-254
Authors:
Kotera, M
Sakai, M
Yamada, K
Tamura, K
Tomo, Y
Simizu, I
Yoshida, A
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., The influence of the Coulomb interaction effect in the electron beam on the developed resist structure for the projection lithography, MICROEL ENG, 57-8, 2001, pp. 255-261
Authors:
Shimada, T
Zhang, L
Abe, K
Yamabe, M
Miyamoto, T
Citation: T. Shimada et al., Developmental morphology of blood and lymphatic capillary networks in mammalian hearts, with special reference to three-dimensional architecture, MA MA SY SE, 7, 2001, pp. 203-211
Authors:
Iba, Y
Kumasaka, F
Iizuka, T
Yamabe, M
Citation: Y. Iba et al., Amorphous refractory compound film material for X-ray mask absorbers, JPN J A P 1, 39(9A), 2000, pp. 5329-5333
Authors:
Kotera, M
Ishida, Y
Naruse, K
Shimizu, I
Tomo, Y
Yoshida, A
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., An improved electron scattering simulation at the mask in a projection lithography system, JPN J A P 1, 39(12B), 2000, pp. 6861-6868
Authors:
Hayashi, K
Maeda, A
Haraoka, K
Kawai, T
Sakudo, N
Yamabe, M
Citation: K. Hayashi et al., Possible designing mesoscopic materials of desired frictional characteristics by phonon-band engineering, PROG T PH S, (138), 2000, pp. 576-577
Authors:
Takayanagi, T
Yamabe, M
Citation: T. Takayanagi et M. Yamabe, Progress of fluoropolymers on coating applications - Development of mineral spirit soluble polymer and aqueous dispersion, PROG ORG C, 40(1-4), 2000, pp. 185-190
Authors:
Yoshida, A
Kojima, Y
Matsuoka, K
Tomo, Y
Shimizu, I
Yamabe, M
Citation: A. Yoshida et al., Study of resist surface roughness in EB lithography, MICROEL ENG, 53(1-4), 2000, pp. 313-316
Authors:
Kotera, M
Yamaguchi, K
Sakai, M
Naruse, K
Okagawa, T
Matsuoka, K
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Influence of electron acceleration voltage in the cell-projection lithography system, MICROEL ENG, 53(1-4), 2000, pp. 353-356
Authors:
Yamabe, M
Akiyama, K
Akatsuka, Y
Kato, M
Citation: M. Yamabe et al., Novel phosphonated perfluorocarbon polymers, EUR POLYM J, 36(5), 2000, pp. 1035-1041
Authors:
Miyake, H
Yamabe, M
Citation: H. Miyake et M. Yamabe, Copolymerization of tetrafluoroethylene and ethylene in fluorinated organic solvents, EUR POLYM J, 36(2), 2000, pp. 379-384
Authors:
Iba, Y
Kumasaka, F
Yamabe, M
Citation: Y. Iba et al., Pattern fabrication technique for Ta-Ge amorphous X-ray absorber on a SiC membrane by inductively coupled plasma, JPN J A P 1, 38(4A), 1999, pp. 2164-2168
Authors:
Kotera, M
Yamaguchi, K
Okagawa, T
Matsuoka, K
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Characteristic variation of exposure pattern in cell-projection electron-beam lithography, JPN J A P 1, 38(12B), 1999, pp. 7031-7034
Authors:
Kotera, M
Yamaguchi, K
Okagawa, T
Matsuoka, K
Kojima, Y
Yamabe, M
Citation: M. Kotera et al., Influence of the mask-scattered electrons in the cell-projection lithography, J VAC SCI B, 17(6), 1999, pp. 2921-2926
Authors:
Yamabe, M
Munekata, S
Kaneko, I
Ukihashi, H
Citation: M. Yamabe et al., Synthesis of perfluorinated vinyl ethers having ester group, J FLUORINE, 94(1), 1999, pp. 65-68
Authors:
Kano, Y
Yamabe, M
Ishimoto, K
Fukuda, H
Citation: Y. Kano et al., The occurrence of bitterness in the leaf and fruit of cucumbers (Cucumis sativus L. cv.Kagafutokyuri) in relation to their nitrogen levels, J JPN S HOR, 68(2), 1999, pp. 391-396
Authors:
Iba, Y
Kumasaka, F
Iizuka, T
Aoyama, H
Yamabe, M
Citation: Y. Iba et al., Characteristics of Ta-based amorphous alloy film for x-ray mask absorbers, J VAC SCI B, 16(6), 1998, pp. 3495-3499
Authors:
Fujii, K
Tanaka, Y
Taguchi, T
Yamabe, M
Suzuki, K
Gomei, Y
Hisatsugu, T
Citation: K. Fujii et al., Low-dose exposure technique for 100-nm-diam hole replication in x-ray lithography, J VAC SCI B, 16(6), 1998, pp. 3504-3508
Authors:
Tanaka, Y
Taguchi, T
Fujii, K
Tsuboi, S
Yamabe, M
Suzuki, K
Gomei, Y
Hisatsugu, T
Fukuda, M
Morita, H
Citation: Y. Tanaka et al., 130 nm and 150 nm line-and-space critical-dimension control evaluation using XS-1 x-ray stepper, J VAC SCI B, 16(6), 1998, pp. 3509-3514
Authors:
Miyake, H
Sugaya, Y
Yamabe, M
Citation: H. Miyake et al., Synthesis and properties of perfluorocarboxylated polymers, J FLUORINE, 92(2), 1998, pp. 137-140
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