Authors:
Chiba, A
Takahashi, M
Yamanashi, H
Hoko, H
Hoshino, E
Hirano, N
Lee, BT
Ogawa, T
Ito, M
Okazaki, S
Citation: A. Chiba et al., Theoretical analysis of placement error due to absorber pattern on extremeultraviolet lithography mask, JPN J A P 1, 40(6A), 2001, pp. 3947-3952
Authors:
Chiba, A
Hoshino, E
Takahashi, M
Yamanashi, H
Ogawa, T
Okazaki, S
Citation: A. Chiba et al., Temperature rise of extreme ultraviolet lithography mask substrate during dry etching process, JPN J A P 1, 40(11), 2001, pp. 6208-6211