Authors: Yun, SM Tynan, GR

Citation: Sm. Yun et Gr. Tynan, Spatial profiles of neutral, ion, and etch uniformity in a large-area high-density plasma reactor, J APPL PHYS, 89(2), 2001, pp. 911-914

Authors: Yun, SM Kim, K

Citation: Sm. Yun et K. Kim, The first isolation of alpha-hydroperoxy-N-arylimidoyl cyanides from 2-arylamino-2-alkenenitriles (alpha-cyanoenamines), TETRAHEDR L, 41(9), 2000, pp. 1469-1473

Authors: Yun, SM Chang, HY Oh, KS Choi, CK

Citation: Sm. Yun et al., Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor, JPN J A P 1, 38(7B), 1999, pp. 4531-4534

Authors: Oh, KS Kang, MS Lee, KM Kim, DS Choi, CK Yun, SM Chang, HY Kim, KH

Citation: Ks. Oh et al., Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition, THIN SOL FI, 345(1), 1999, pp. 45-49

Authors: Yun, SM Chang, HY Kang, MS Choi, CK

Citation: Sm. Yun et al., Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor, THIN SOL FI, 341(1-2), 1999, pp. 109-111