Authors: SMITH BW FONSECA C ZAVYALOVA L ALAM Z BOUROV A

Citation: Bw. Smith et al., PLASMA REACTIVE ION ETCHING OF 193 NM ATTENUATED PHASE-SHIFT MASK MATERIALS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2259-2262

Authors: SMITH BW ZAVYALOVA L BOUROV A BUTT S FONSECA C

Citation: Bw. Smith et al., INVESTIGATION INTO EXCIMER-LASER RADIATION-DAMAGE OF DEEP-ULTRAVIOLETOPTICAL-PHASE MASKING FILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2444-2447