Authors:
Blauw, MA
Zijlstra, T
Bakker, RA
van der Drift, E
Citation: Ma. Blauw et al., Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching, J VAC SCI B, 18(6), 2000, pp. 3453-3461
Authors:
Andriesse, MS
Zijlstra, T
van der Drift, E
Citation: Ms. Andriesse et al., High speed anisotropic dry etching of CoNbZr for next generation magnetic recording, J VAC SCI B, 18(6), 2000, pp. 3462-3466
Authors:
Lukey, PW
Caro, J
Zijlstra, T
van der Drift, E
Radelaar, S
Citation: Pw. Lukey et al., The influence of strain relaxation on the electrical properties of submicron Si/SiGe resonant-tunneling diodes, ANALOG IN C, 24(1), 2000, pp. 27-35
Authors:
Zijlstra, T
van der Drift, E
de Dood, MJA
Snoeks, E
Polman, A
Citation: T. Zijlstra et al., Fabrication of two-dimensional photonic crystal waveguides for 1.5 mu m insilicon by deep anisotropic dry etching, J VAC SCI B, 17(6), 1999, pp. 2734-2739