Citation: Th. Wang et al., A comprehensive study of hot carrier stress-induced drain leakage current degradation in thin-oxide n-MOSFET's, IEEE DEVICE, 46(9), 1999, pp. 1877-1882
Authors:
Zous, NK
Wang, TH
Yeh, CC
Tsai, CW
Huang, CM
Citation: Nk. Zous et al., Transient effects of positive oxide charge on stress-induced leakage current in tunnel oxides, APPL PHYS L, 75(5), 1999, pp. 734-736