Zg. Wang et al., MOLECULAR MECHANISM OF BASE EXCISION-REPAIR OF URACIL-CONTAINING DNA IN YEAST CELL-FREE-EXTRACTS, The Journal of biological chemistry, 272(38), 1997, pp. 24064-24071
Base excision repair (BER) constitutes a ubiquitous excision repair me
chanism, which is responsible for the removal of multiple types of dam
aged and inappropriate bases in DNA. We have employed a yeast cell-fre
e system to examine the biochemical mechanism of the BER pathway in lo
wer eukaryotes. Using uracil-containing DNA as a model substrate, we d
emonstrate that yeast BER requires Apn1 protein, an Escherichia coli e
ndonuclease IV homolog. In extracts of an apn1 deletion mutant, the 5'
-incision at AP (apurinic/apyrimidinic) sites is not detectable, suppo
rting the notion that yeast contains only one major 5'-AP endonuclease
. The processing of the 5'-deoxyribose phosphate moieties was found to
be a rate-limiting step. During BER of uracil-containing DNA, repair
patch sizes of 1-5 nucleotides were detected, with single nucleotide r
epair patches predominant.