MULTI-ION-BEAM REACTIVE COSPUTTERING TECHNIQUE AND ITS DEVELOPMENT

Authors
XIAO DQ ZHU JG SVIRIDOV EV PENG WB
Citation
Dq. Xiao et al., MULTI-ION-BEAM REACTIVE COSPUTTERING TECHNIQUE AND ITS DEVELOPMENT, Ferroelectrics, 195(1-4), 1997, pp. 215-220
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Material Science
Journal title
Ferroelectrics → ACNP
ISSN journal
00150193
Volume
195
Issue
1-4
Year of publication
1997
Pages
215 - 220
Database
ISI
SICI code
0015-0193(1997)195:1-4<215:MRCTAI>2.0.ZU;2-E
Abstract
The latest results on ferroelectric thin film deposition by recently d esigned multi-ion-beam reactive cosputtering (MIBRECS) technique are b riefly summarized. A model for the process is considered, and further development of the technique is proposed.