EPITAXIAL FERROELECTRIC THIN-FILMS PREPARED BY THE SOL-GEL TECHNIQUE

Citation
Yh. Xu et al., EPITAXIAL FERROELECTRIC THIN-FILMS PREPARED BY THE SOL-GEL TECHNIQUE, Ferroelectrics, 195(1-4), 1997, pp. 283-288
Citations number
8
Categorie Soggetti
Physics, Condensed Matter","Material Science
Journal title
ISSN journal
00150193
Volume
195
Issue
1-4
Year of publication
1997
Pages
283 - 288
Database
ISI
SICI code
0015-0193(1997)195:1-4<283:EFTPBT>2.0.ZU;2-0
Abstract
The sol-gel process was used to fabricate epitaxial thin films of crys talline ferroelectric oxides, including KNbO3 film on single crystal s ubstrates of MgO and SrTiO3, LiNbO3 film on LiTaO3 and alternatively m ultilayer nX(SrTiO3/PbTiO3) Films on SrTiO3. Fabrication of these epit axial thin films will be described. The structure of these films has b een studied with X-ray, electron diffraction, and high resolution elec tron microscopy. Second harmonic generation of 1064 nm incident light was demonstrated in KNbO3 waveguides. Transient photorefractive gratin gs in Fe-doped KNbO3 were studied by a two-beam coupling technique at various writing intensity and wavelength.