TIO2 THIN-FILMS FORMATION ON INDUSTRIAL GLASS THROUGH SELF-ASSEMBLY PROCESSING

Citation
D. Huang et al., TIO2 THIN-FILMS FORMATION ON INDUSTRIAL GLASS THROUGH SELF-ASSEMBLY PROCESSING, Thin solid films, 305(1-2), 1997, pp. 110-115
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
305
Issue
1-2
Year of publication
1997
Pages
110 - 115
Database
ISI
SICI code
0040-6090(1997)305:1-2<110:TTFOIG>2.0.ZU;2-9
Abstract
Silane coupling reagent ((CH3O)(3)Si(CH2)(3)SH) was self-assembled on the industrial glass substrates to form two-dimensional organic monola yer and the terminal -SH functional group was oxidized into -SO3H grou ps in situ. By exploiting the chemisorption properties of the -SO3H gr oup, titanium dioxide (TiO2) thin films were prepared by deposition in aqueous HCl solution of TiCl4 at 80 degrees C. X-ray photoelectron sp ectroscopy (XPS) analysis showed that TiO2 thin films were successfull y prepared, and atomic force microscopy (AFM) images confirmed that th e films were consisted of packed TiO2 crystallites over 100 nm in size . TiO2 thin films were in excellent adherence. The synthesis of TiO2 f ilms has a prospect in industrial application. (C) 1997 Elsevier Scien ce S.A.