S. Kanakaraju et al., OPTICAL AND STRUCTURAL-PROPERTIES OF REACTIVE ION-BEAM SPUTTER-DEPOSITED CEO2 FILMS, Thin solid films, 305(1-2), 1997, pp. 191-195
Optical and structural properties of reactive ion beam sputter deposit
ed CeO2 films as a function of oxygen partial pressures (P-O2) and sub
strate temperatures (T-s) have been investigated. The films deposited
at ambient temperature with P-O2 of 0.01 Pa have shown a refractive in
dex of 2.36 which increased to 2.44 at 400 degrees C. Refractive index
and extinction coefficient are sensitive up to a T-s of similar to 20
0 degrees C. Raman spectroscopy and X-ray diffraction (XRD) have been
used to characterise the structural properties. A preferential orienta
tion of (220) was observed up to a T-s of 200 degrees C and it changed
to (200) at 400 degrees C: and above. Raman line broadening, peak shi
ft and XRD broadening indicate the formation of nanocrystalline phase
for the films deposited up to a substrate temperature of 300 degrees C
. However, crystallinity of the films were better for T-s values above
300 degrees C. In general both optical and structural properties were
unusual compared to the films deposited by conventional electron beam
evaporation, but were similar in some aspects to those deposited by i
on-assisted deposition. Apart from thermal effects, this behavior is a
lso attributed to the bombardment of backscattered ions/neutrals on th
e growing film as well as the higher kinetic energy of the condensing
species, together resulting in increased packing density. (C) 1997 Els
evier Science S.A.