J. Aarik et al., EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION, Thin solid films, 305(1-2), 1997, pp. 270-273
The dependence of optical characteristics on the structure of atomic-l
ayer-deposited titania (TiO2) thin films is studied. Amorphous films g
rown at 100 degrees C have an optical band gap of 3.3 eV while the ref
ractive index values of these films range from 2.2 to 2.3 at a wavelen
gth of 633 nm. The refractive index can be increased up to 2.65 by usi
ng the growth temperatures about 300 degrees C. Composition and struct
ure studies reveal that the formation of preferentially oriented cryst
al (anatase) structure contributes to this increase of refractive inde
x most significantly. (C) 1997 Elsevier Science S.A.