PHOTOVOLTAMMETRY AND SURFACE-ANALYSIS OF MOSE2 THIN-FILMS PREPARED BYAN INTERCALATION-EXFOLIATION METHOD

Citation
Rj. Castro et Cr. Cabrera, PHOTOVOLTAMMETRY AND SURFACE-ANALYSIS OF MOSE2 THIN-FILMS PREPARED BYAN INTERCALATION-EXFOLIATION METHOD, Journal of the Electrochemical Society, 144(9), 1997, pp. 3135-3140
Citations number
35
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
144
Issue
9
Year of publication
1997
Pages
3135 - 3140
Database
ISI
SICI code
0013-4651(1997)144:9<3135:PASOMT>2.0.ZU;2-W
Abstract
Thin MoSe2 films on Ti substrates were prepared by an intercalation-ex foliation method. Large-area semiconductor films were obtained by this technique. Characterization of these films was done by cyclic voltamm etry, x-ray diffraction, and surface-analysis techniques. Highly repro ducible cyclic voltammograms were obtained, both in 5 mM ferrocene and 5 mM chloranil solutions in acetonitrile, with and without illuminati on. X-ray diffraction analyses showed the presence of a highly texture d MoSe2 film. The MoSe2 particles, 0.5 to 5 mu M diam, in the film beh ave as short-circuited microcells in which both reduction and oxidatio n processes can take place in solution.