T. Osaka et al., CLASSIFICATION OF THE PORE STRUCTURE OF N-TYPE SILICON AND ITS MICROSTRUCTURE, Journal of the Electrochemical Society, 144(9), 1997, pp. 3226-3237
Porous silicon samples were grown under various anodization conditions
on {100} oriented n-silicon substrates. Scanning and transmission ele
ctron microscope observations have shown that the microstructure of po
rous silicon primarily falls into three categories, which can be class
ified as single layer, double layer, and large macropore types. These
three types differ not only in their microstructural details, but also
in luminescence properties. In all three types of samples, the inner
surface of pores created by anodization is coated with a low density a
morphous material, which contained silicon and oxygen. In addition, al
l the pore surfaces were roughened by anodization, leaving nanoscale c
rystalline silicon asperities.