CLASSIFICATION OF THE PORE STRUCTURE OF N-TYPE SILICON AND ITS MICROSTRUCTURE

Citation
T. Osaka et al., CLASSIFICATION OF THE PORE STRUCTURE OF N-TYPE SILICON AND ITS MICROSTRUCTURE, Journal of the Electrochemical Society, 144(9), 1997, pp. 3226-3237
Citations number
28
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
144
Issue
9
Year of publication
1997
Pages
3226 - 3237
Database
ISI
SICI code
0013-4651(1997)144:9<3226:COTPSO>2.0.ZU;2-9
Abstract
Porous silicon samples were grown under various anodization conditions on {100} oriented n-silicon substrates. Scanning and transmission ele ctron microscope observations have shown that the microstructure of po rous silicon primarily falls into three categories, which can be class ified as single layer, double layer, and large macropore types. These three types differ not only in their microstructural details, but also in luminescence properties. In all three types of samples, the inner surface of pores created by anodization is coated with a low density a morphous material, which contained silicon and oxygen. In addition, al l the pore surfaces were roughened by anodization, leaving nanoscale c rystalline silicon asperities.