We investigate the kinetic pathways to coherent island formation durin
g the stress-driven roughening of strained films, and specifically exa
mine the role of facets during island nucleation. Despite the ubiquito
us appearance of {501} facets in the Si-Ge system, we show that for Ge
0.5Si0.5 strained layers, the initial islanding pathway does not invol
ve discrete {501} facets. A kinetic model based on interacting surface
steps is developed, which explains the observed pathway and is consis
tent with the sensitive dependence of the 2D-3D transition on temperat
ure and the sign of misfit.