HYDROGEN ANALYSIS OF SILICON SURFACES BY LOW-ENERGY ION-BEAMS

Authors
Citation
F. Shoji et K. Oura, HYDROGEN ANALYSIS OF SILICON SURFACES BY LOW-ENERGY ION-BEAMS, Journal of nuclear materials, 248, 1997, pp. 443-447
Citations number
18
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
ISSN journal
00223115
Volume
248
Year of publication
1997
Pages
443 - 447
Database
ISI
SICI code
0022-3115(1997)248:<443:HAOSSB>2.0.ZU;2-6
Abstract
For the analysis of hydrogen adsorption on silicon surfaces, low-energ y recoil ion spectroscopy (LE-RIS) is one of the most powerful methods because it directly provides information over 'real-space' interatomi c distance and the adsorbed coordinates. Observing both the surface re coils and the direct recoils which are created by He ion beams, we inv estigate the structure of Si(100)-1 X 1:2H dihydride and Si(100)-2 X 1 :H monohydride surfaces. Comparing our experimental results with compu ter simulations, we conclude that the H-Si bond angle in the Si(100)-2 X 1:H monohydride surface is 65-70 degrees and that in the Si(100)-1 X 1:2H dihydride surface is 55-60 degrees. For this dihydride surface, a canted dihydride structure is suggested rather than a symmetric dih ydride structure. (C) 1997 Elsevier Science B.V.