DEPOSITION OF SUPERHARD AMORPHOUS-CARBON FILMS BY PULSED-ARC SOURCES

Authors
SCHEIBE HJ SCHULTRICH B ZIEGELE H SIEMROTH P
Citation
Hj. Scheibe et al., DEPOSITION OF SUPERHARD AMORPHOUS-CARBON FILMS BY PULSED-ARC SOURCES, IEEE transactions on plasma science, 25(4), 1997, pp. 685-688
Citations number
10
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
IEEE transactions on plasma science → ACNP
ISSN journal
00933813
Volume
25
Issue
4
Year of publication
1997
Pages
685 - 688
Database
ISI
SICI code
0093-3813(1997)25:4<685:DOSAFB>2.0.ZU;2-L
Abstract
Hydrogen-free amorphous carbon films with hardness comparable to cryst alline superhard materials have been deposited by special pulsed are t echniques. With the combination of very high hardness, high smoothness , and low adhesion activity to other materials which are in contact wi th them, these films show superior behavior in wear and slide applicat ions. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed.