IMPROVEMENT OF SILICON ETCHING RESOLUTION USING THE CONFINED ETCHANT LAYER TECHNIQUE

Authors
ZU YB XIE L TIAN ZW XIE ZX MU JQ MAO BW
Citation
Yb. Zu et al., IMPROVEMENT OF SILICON ETCHING RESOLUTION USING THE CONFINED ETCHANT LAYER TECHNIQUE, Chinese Science Bulletin, 42(15), 1997, pp. 1318-1319
Citations number
8
Categorie Soggetti
Multidisciplinary Sciences
Journal title
Chinese Science Bulletin → ACNP
ISSN journal
10016538
Volume
42
Issue
15
Year of publication
1997
Pages
1318 - 1319
Database
ISI
SICI code
1001-6538(1997)42:15<1318:IOSERU>2.0.ZU;2-7