K. Karasawa et al., CONTACT RESISTANCE INCREASE IN PALLADIUM MATERIAL AS A RESULT OF MECHANOCHEMICAL REACTION, Electronics & communications in Japan. Part 2, Electronics, 80(2), 1997, pp. 33-44
In small-size relays used under low current, mechanical actions of con
tacts at make-break, such as impact and wipe, can affect contact deter
ioration more than electric factors such as arcing and Joule heat. In
this article, the effects of vertical impact and horizontal wipe were
studied in separate experiments in order to clarify the mechanism by w
hich a palladium oxide film is formed on the contact area and the cont
act resistance is rapidly increased by make-break operations under no
load in air. The experiments show that the main factor of contact resi
stance increase is the formation of an accumulated layer made of insul
ation powders by wipe action. Based on this fact, models of contact su
rface condition during operations are suggested to explain the variati
on of contact resistance. In addition, the effect of passing current t
hrough the contacts is also explained by the models. (C) 1997 Scripta
Technica, Inc.