N. Fukata et al., HYDROGEN MOLECULES AND HYDROGEN-RELATED DEFECTS IN CRYSTALLINE SILICON, Physical review. B, Condensed matter, 56(11), 1997, pp. 6642-6647
We have found that hydrogen exists in molecular form in crystalline si
licon treated with hydrogen atoms in the downstream of a hydrogen plas
ma. The vibrational Raman line of hydrogen molecules is observed at 41
58 cm(-1) for silicon samples hydrogenated between 180 and 500 degrees
C. The assignment of the Raman line is confirmed by its isotope shift
to 2990 cm(-1) for silicon treated with deuterium atoms. The Raman in
tensity has a maximum for hydrogenation at 400 degrees C. The vibratio
nal Raman line of the hydrogen molecules is broad and asymmetric. It c
onsists of at least two components, possibly arising from hydrogen mol
ecules in different occupation sites in crystalline silicon. The rotat
ional Raman lint of hydrogen molecules is observed at 590 cm(-1). The
Raman band of Si-H stretching is observed for hydrogenation temperatur
es between 100 and 500 degrees C and the intensity has a maximum for h
ydrogenation at 250 degrees C.