Jt. Barbas et al., SPECTROSCOPY AND PHOTOCHEMISTRY OF FLUORENE AT A SILICA GEL AIR INTERFACE/, Journal of photochemistry and photobiology. A, Chemistry, 109(3), 1997, pp. 229-236
The emission spectroscopy of fluorene has been studied at a silica gel
/air interface at surface loadings from 1.5% to 77.1% of a monolayer.
Both monomer and excimer-like emissions are observed on the surface. T
he excimer-like emission, centered at 350 nm, arises from excitation o
f ground-state van der Waals pairs of fluorene molecules. Photolysis i
nto the van der Waals dimers at room temperature does not lead to diss
ociation into constituent monomers; however, irradiation of fluorene m
onomers at a silica gel/air interface leads to production of 9-fluoren
one as the only identifiable photoproduct in 72% yield. Fluorene tripl
et and cation radical are both observed at the silica gel/air interfac
e by transient diffuse reflectance spectroscopy. Sensitization of sing
let molecular oxygen by silica-sorbed methylene blue, in the presence
of co-sorbed fluorene, does not lead to fluorene oxidation, thus sugge
sting that oxidation by direct photolysis does not involve an energy t
ransfer mechanism. An electron transfer oxidation mechanism is propose
d to account for the observed photochemical oxidation of fluorene at t
he silica gel/air interface. (C) 1997 Published by Elsevier Science S.
A.