A PHOTOELECTRON DIFFRACTION STUDY OF THE STRUCTURE OF ULTRATHIN IRON FILMS ON CU(100)

Citation
A. Theobald et al., A PHOTOELECTRON DIFFRACTION STUDY OF THE STRUCTURE OF ULTRATHIN IRON FILMS ON CU(100), Surface science, 385(1), 1997, pp. 107-114
Citations number
26
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
385
Issue
1
Year of publication
1997
Pages
107 - 114
Database
ISI
SICI code
0039-6028(1997)385:1<107:APDSOT>2.0.ZU;2-7
Abstract
Using photoelectron diffraction in the scanned energy mode we have inv estigated the structure of ultrathin iron films on Cu(110). Up to a co verage of at least five monolayer equivalents (5 MLE) the film grows p seudomorphically. A quantitative analysis of the diffraction data at 1 MLE shows that the film has an island structure. The islands which co nsist of at least two to three layers are characterised by a strong co ntraction of the outermost Fe-Fe interlayer spacing compared to the bu lk. (C) 1997 Elsevier Science B.V.