P. Barth et V. Krivan, ELECTROTHERMAL VAPORIZATION INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION SPECTROMETRIC TECHNIQUE USING A TUNGSTEN COIL FURNACE AND SLURRY SAMPLING, Journal of analytical atomic spectrometry, 9(7), 1994, pp. 773-777
A simple and inexpensive electrothermal vaporization device consisting
of a double-layer tungsten coil, of the type normally manufactured fo
r halogen lamps, was used for the simultaneous determination of Al, Ca
, Cr, Cu, Fe, Mg, Mn, Ni and Ti in aqueous suspensions of silicon carb
ide powder by inductively coupled plasma atomic emission spectrometry
(ICP-AES). Possible interferences were investigated and background cor
rection are discussed. Excluding Al, the limits of detection achievabl
e were at the sub-mug g-1 and mug g-1 level. The accuracy was checked
by comparison of the results with those obtained by instrumental neutr
on activation analysis (INAA), slurry sampling electrothermal atomic a
bsorption spectrometry and ICP-AES involving decomposition of the samp
le. The precision expressed as relative standard deviation was between
3.3% (for 210 mug g-1 of Ti) and 13.5% (for 8.9 mug g-1 of Ni).