ELECTROTHERMAL VAPORIZATION INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION SPECTROMETRIC TECHNIQUE USING A TUNGSTEN COIL FURNACE AND SLURRY SAMPLING

Authors
Citation
P. Barth et V. Krivan, ELECTROTHERMAL VAPORIZATION INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION SPECTROMETRIC TECHNIQUE USING A TUNGSTEN COIL FURNACE AND SLURRY SAMPLING, Journal of analytical atomic spectrometry, 9(7), 1994, pp. 773-777
Citations number
46
Categorie Soggetti
Spectroscopy
ISSN journal
02679477
Volume
9
Issue
7
Year of publication
1994
Pages
773 - 777
Database
ISI
SICI code
0267-9477(1994)9:7<773:EVIPE>2.0.ZU;2-9
Abstract
A simple and inexpensive electrothermal vaporization device consisting of a double-layer tungsten coil, of the type normally manufactured fo r halogen lamps, was used for the simultaneous determination of Al, Ca , Cr, Cu, Fe, Mg, Mn, Ni and Ti in aqueous suspensions of silicon carb ide powder by inductively coupled plasma atomic emission spectrometry (ICP-AES). Possible interferences were investigated and background cor rection are discussed. Excluding Al, the limits of detection achievabl e were at the sub-mug g-1 and mug g-1 level. The accuracy was checked by comparison of the results with those obtained by instrumental neutr on activation analysis (INAA), slurry sampling electrothermal atomic a bsorption spectrometry and ICP-AES involving decomposition of the samp le. The precision expressed as relative standard deviation was between 3.3% (for 210 mug g-1 of Ti) and 13.5% (for 8.9 mug g-1 of Ni).