C-axis-oriented Bi2Sr1.6L0.4CuO6 thin films deposited on (100)SrTiO3,
(100)LaAlO3 and (100)MgO substrates by RF-magnetron sputtering were st
udied with AFM (Atomic Force Microscope). Film thickness ranged from 1
5 nm to 600 nm. Different from YBCO thin films, AFM images of Bi-2201
thin films showed a terraced island growth mode with half-unit-cell gr
owth unit in c-axis.