CORRELATION BETWEEN SURFACE-RESISTANCE OF YBA2CU3O7-DELTA THIN-FILMS AND OXYGEN-PRESSURE DURING DEPOSITION PROCESS

Citation
Rx. Wu et al., CORRELATION BETWEEN SURFACE-RESISTANCE OF YBA2CU3O7-DELTA THIN-FILMS AND OXYGEN-PRESSURE DURING DEPOSITION PROCESS, Physica. C, Superconductivity, 282, 1997, pp. 591-592
Citations number
5
Categorie Soggetti
Physics, Applied
ISSN journal
09214534
Volume
282
Year of publication
1997
Part
2
Pages
591 - 592
Database
ISI
SICI code
0921-4534(1997)282:<591:CBSOYT>2.0.ZU;2-V
Abstract
In this paper, we study the correlation between the depositing oxygen pressure and surface resistance R-s of YBa2Cu3O7-delta (YBCO) films fa bricated by pulsed-laser deposition method. It reveals that oxygen pre ssure has great influence on R-s. In terms of minimum R-s, there exist s optimum value of oxygen pressure which is different from the optimum oxygen pressure for maximum T-c. The crystalline orientation and surf ace morphologies of the films are helpful in understanding the variati ons of R-s with the oxygen pressure.