TI-SAPPHIRE PLANAR WAVE-GUIDE LASER GROWN BY PULSED-LASER DEPOSITION

We document the lasing performance of a waveguiding layer of Ti:sapphi re, of similar to 12-mu m thickness, grown by pulsed laser deposition from a 0.12-wt.% Ti2O3 Ti:sapphire single-crystal target onto an undop ed z-cut sapphire substrate. Lasing around 800 nm is observed when the waveguide layer is pumped by an argonion laser running on all-blue-gr een lines, with an absorbed power threshold of 0.56 W, with high-refle ctivity (R > 98%) mirrors. With a 5% pump duty cycle and a T = 35% out put coupler, a slope efficiency of 26% with respect to absorbed power is obtained, giving quasi-cw output powers in excess of 350 mW. (C) 19 97 Optical Society of America.