EPITAXIAL-GROWTH OF THIN-FILMS OF SRTI1-XRUXO3-DELTA BY PULSED-LASER DEPOSITION

Citation
A. Gupta et al., EPITAXIAL-GROWTH OF THIN-FILMS OF SRTI1-XRUXO3-DELTA BY PULSED-LASER DEPOSITION, Materials research bulletin, 31(12), 1996, pp. 1463-1470
Citations number
12
Categorie Soggetti
Material Science
Journal title
ISSN journal
00255408
Volume
31
Issue
12
Year of publication
1996
Pages
1463 - 1470
Database
ISI
SICI code
0025-5408(1996)31:12<1463:EOTOSB>2.0.ZU;2-4
Abstract
The pulsed laser deposition technique has been utilized for thin film synthesis of a continuous series of solid solutions of the end member perovskite compounds SrTiO3 and SrRuO3. The SrTi1-xRuxO3-d (0 less tha n or equal to x less than or equal to 1) films are grown epitaxially o n (100)-oriented SrTiO3 substrates in a low pressure atomic oxygen amb ient with in situ monitoring using reflection high-energy electron dif fraction (RHEED). The as-deposited films are cubic or pseudocubic over the whole composition range with the lattice parameter increasing con tinuously with increasing Ru4+ substitution. Correspondingly, the resi stivity evolves from insulating to metallic behavior. The solid soluti on films are potentially useful as latticed-matched buffer layers for heteroepitaxial growth, or as barrier layers in tunnel junctions with controlled resistive properties.